Juni 19, 2009
Industry-leading excellence will be on display during the 2009 SGIA Expo (New Orleans, October 7–9), showcasing the entries of SGIA’s award competitions. Imagers are encouraged to submit their best work or nominate their deserving colleagues for the awards. Honored are technological advancements and innovative ideas that move the imaging industry forward, said Michael Robertson, SGIA’s President and CEO.
This year’s competitions include:
Golden Image (including André Schellenberg) (Entry deadline: September 25) — Printer members receive one free entry and can enter almost any kind of imaged product.
Product of the Year (Entry deadline: September 25) — Suppliers can submit leading equipment and supplies that have impacted wide-format digital imaging.
Howard Parmele Award (Entry deadline: July 15) — SGIA’s highest honor recognizes ongoing commitments of a professional who has advanced specialty imaging’s products, services or overall image.
Innovator Award (Entry deadline: September 1) — Industry professionals who have made a strong, lasting impact on the industry. They must work or have worked at a printing/imaging company or a company that supplies materials, equipment or technical information.
ASPT Student Awards Competition (Entry deadline: July 17) — Students in secondary or post-secondary schools holding SGIA membership can enter a variety of screen and digital imaging categories.
All award entries are showcased and evaluated during the 2009 SGIA Expo in the Golden Image Gallery.
SGIA Award Competition
April 7, 2009
The international exhibition on photonics and optoelectronics will be back at Milan Fair Centre from Nov. 25-27. After its great success in 2008, with the participation of more than 80 companies from all over the world, the show brings together all the protagonists involved in the creation, control and manipulation of photons and light rays. Important participants include global companies committed to photonics with a focus on innovation, research and specialized industry for the creation of multiple applications. Photonica Expo 2009 confirms its position as an event with international characteristics where the most important worldwide companies involved in this promising technology will be present. The event will take place within HTE-Hi.Tech.Expo the specialized event dedicated to the most promising and advanced technologies.
April 2, 2009
From March 17-19, LASER World of PHOTONICS China 2009 took place at the Shanghai New International Expo Center. The exposition maintained its positive growth trend this year. It occupied a total exhibition area of 9,000 m². In addition, 220 exhibitors from 14 countries participated, which represents an improvement of 6.8% over 2008. Attendee participation outpaced the expectations of both the organizers and exhibitors alike. A number of over 22,000 visitors from 32 nations and districts participated, which represents an increase of 20% over last year. The next event will be held at Shanghai New International Expo Center from March 16-18, 2010.
März 27, 2009
From Sep. 6-9, 2009 the 11th China International Optoelectronics Expo (CIOE) will take place in the Shenzhen Convention & Exhibition Center in Shenzhen, China. It address to representatives working in the fields of optoelectronics manufacturing, automotive and aerospace, microelectronics manufacturing, semiconductors, mechanical engineering and processing, biotechnology, pharmaceutical technology as well as in research, science and government institutions. The 2009 CIOE will present the three sub-expositions on 70,000 m²:
– Optical communications, sensors, lasers and infrared applications expo
– Precision optics expo
– LED expo